发明名称 |
Methods of forming patterned reticles |
摘要 |
The invention includes methods of forming patterned reticles. Design features can be introduced into a layout for a reticle prior to optical proximity correction, and then removed prior to taping a pattern onto the reticle. Design features can alternatively, or additionally, be introduced after optical proximity correction and asymmetrically relative to one or more parts of a reticle pattern. The introduced features can subsequently be taped to the reticle as part of the formation of the patterned reticle.
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申请公布号 |
US2005008949(A1) |
申请公布日期 |
2005.01.13 |
申请号 |
US20040912029 |
申请日期 |
2004.08.04 |
申请人 |
DULMAN H. DANIEL;STANTON WILLIAM A.;FUTRELL JOHN R.C. |
发明人 |
DULMAN H. DANIEL;STANTON WILLIAM A.;FUTRELL JOHN R.C. |
分类号 |
G03C5/00;G03F1/14;G03F9/00;G06F17/50;(IPC1-7):G06F17/50 |
主分类号 |
G03C5/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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