PHOTOACID GENERATORS

摘要

A composition useful for forming a photoresist layer at i-line (365 nm) comprising (a) a film forming resin; (b) a compound represented by the following formula (I) wherein R1 is a C1-20 alkyl group, C6-20 aryl group, or C6-20 aralkyl group, the C1-20 alkyl group, C6-20 aryl group, or C6-20 aralkyl group being unsubstituted or substituted by one or more groups selected from halogen, C1-20 alkyl, C1-8 perfluoroalkyl, C1-20 alkoxy, cyano, hydroxyl, or nitro; R2 and R3 are each independently selected from hydrogen, C1-8 alkyl, C1-8 perfluoroalkyl, C1-8 alkoxy, nitro, halogen, carboxyl, hydroxyl, and sulfate; each of m and n are independently 0 or a positive integer; and X<->is a non-nucleophilic anion of an acid; (c) optionally, additives to adjust the optical, mechanical and film forming properties; (d) optionally, a base or radiation sensitive base; and (e) a solvent.