DIFFUSION AND ACTIVATION CONTROL OF IMPLANTED DOPANTS WITH ATHERMALES ANNEALING,申请号EP20030718188-传众专利搜索

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发明名称	DIFFUSION AND ACTIVATION CONTROL OF IMPLANTED DOPANTS WITH ATHERMALES ANNEALING
摘要
申请公布号	EP1495490(A2)	申请公布日期	2005.01.12
申请号	EP20030718188	申请日期	2003.04.01
申请人	VARIAN SEMICONDUCTOR EQUIPMENT ASSOCIATES INC.	发明人	DOWNEY, DANIEL;AREVALO, EDWIN
分类号	H01L21/22;H01L21/223;H01L21/265;H01L21/268;H01L21/324;(IPC1-7):H01L21/324;H01J37/32;H01L21/225	主分类号	H01L21/22
代理机构		代理人
主权项
地址

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