WAFER REVIEW APPARATUS FOR REVIEWING DEFECTS OF WAFER BY USING OPTICAL MICROSCOPE AND ATOMIC FORCE MICROSCOPE

摘要

PURPOSE: A wafer review apparatus is provided to perform rapidly a process for reviewing defects of a wafer by using an optical microscope and an atomic force microscope. CONSTITUTION: A storage unit(200) stores a defect map received from a wafer inspection system. An optical microscope(300) is used for reviewing defects on the defect map by using an object lens and an eyepiece. An atomic force microscope(400) reviewing defects on the defect map in atom units by using a cantilever. An input unit(500) selects one of the optical microscope and the atomic force microscope. A display unit(600) forms the defects as images. A stage(700) is used for supporting the wafer having the defects. A control unit(800) controls the storage unit, the optical microscope, the atomic force microscope, the input unit, the display unit, and the stage.