APPARATUS OF SUPPORTING AND LEVELING FOCUS RING SURROUNDING CHUCK FOR PREVENTING ERROR DUE TO MISALIGNMENT OF FOCUS RING BY STABLY MAINTAINING FOCUS RING IN LEVELING STATE

摘要

PURPOSE: An apparatus of supporting and leveling a focus ring surrounding a chuck is provided to prevent an error due to misalignment of the focus ring by stably maintaining the focus ring in a leveling state. CONSTITUTION: A focus ring(150) is introduced around a chuck in order to condense plasma onto a wafer. A screw(200) is used for leveling and supporting the focus ring. A supporting part(300) has a groove into which the screw is inserted. A spring(250) is inserted into the screw in order to maintain stably the inserting state of the screw into the groove by applying the force fixing the screw to the screw. A plurality of washers(230) are inserted into the screw in order to fix the screw.