发明名称 SEMICONDUCTOR FABRICATION APPARATUS FOR PHOTO-LITHOGRAPHY PROCESS FOR IMPROVING PROCESS EFFICIENCY BY PERFORMING SPREADING PROCESS AND DEVELOPING PROCESS, RESPECTIVELY
摘要 PURPOSE: A semiconductor fabrication apparatus for photo-lithography process is provided to improve the process efficiency by performing a spreading process and a developing process, respectively. CONSTITUTION: A first processing region(120) is connected to a loading/unloading port(110). A plurality of spreading modules are arranged in a lateral direction of the first processing region. A second processing region(130) is connected to the loading/unloading port. A plurality of developing modules are arranged in a lateral direction of the second processing region. A third processing region(140) has a predetermined space including the first and the second processing region. A plurality of spreading modules are arranged in a longitudinal direction of the third processing region. An exposure system(150) is connected to the third processing region through an interface port.
申请公布号 KR20050004463(A) 申请公布日期 2005.01.12
申请号 KR20030044653 申请日期 2003.07.02
申请人 DNS KOREA CO., LTD. 发明人 KANG, HEE YOUNG;KIM, DONG HO
分类号 H01L21/027;(IPC1-7):H01L21/027 主分类号 H01L21/027
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