发明名称 |
SEMICONDUCTOR FABRICATION APPARATUS FOR PHOTO-LITHOGRAPHY PROCESS FOR IMPROVING PROCESS EFFICIENCY BY PERFORMING SPREADING PROCESS AND DEVELOPING PROCESS, RESPECTIVELY |
摘要 |
PURPOSE: A semiconductor fabrication apparatus for photo-lithography process is provided to improve the process efficiency by performing a spreading process and a developing process, respectively. CONSTITUTION: A first processing region(120) is connected to a loading/unloading port(110). A plurality of spreading modules are arranged in a lateral direction of the first processing region. A second processing region(130) is connected to the loading/unloading port. A plurality of developing modules are arranged in a lateral direction of the second processing region. A third processing region(140) has a predetermined space including the first and the second processing region. A plurality of spreading modules are arranged in a longitudinal direction of the third processing region. An exposure system(150) is connected to the third processing region through an interface port.
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申请公布号 |
KR20050004463(A) |
申请公布日期 |
2005.01.12 |
申请号 |
KR20030044653 |
申请日期 |
2003.07.02 |
申请人 |
DNS KOREA CO., LTD. |
发明人 |
KANG, HEE YOUNG;KIM, DONG HO |
分类号 |
H01L21/027;(IPC1-7):H01L21/027 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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