PROCESS GAS SUPPLY APPARATUS FOR PREVENTING CORROSION OF CHAMBER DUE TO PROCESS GAS BY PROVIDING PROCESS GAS INTO CHAMBER THROUGH ADDITIONAL TUBE

摘要

PURPOSE: A process gas supply apparatus is provided to prevent corrosion of a chamber due to a process gas by providing the process gas into the chamber through an additional tube. CONSTITUTION: One or more gas inflow tube(140) is used for supplying a process gas into a chamber(100). A first tube(160) is installed in a wall of the chamber and is connected to the gas inflow tube. A second tube(280) is installed in a lead assembly(200). One end and the other end of the second tube are connected to a gas injection part(210) and the first tube, respectively. A gas supply unit(260) is inserted between the first and the second tubes within the lead assembly.