发明名称 OVERLAY KEY HAVING PLURAL INTERSECTIONS AND METHOD OF MEASURING OVERLAY USING THE SAME FOR ACCURATELY MEASURING OVERLAY OF FINE PATTERN BY USING PLURAL MAIN SCALES AND PLURAL VERNIERS
摘要 PURPOSE: An overlay key having plural intersections and a method of measuring an overlay using the same are provided to measure accurately an overlay of a fine pattern by using plural main scales and plural verniers. CONSTITUTION: An overlay key includes a plurality of main scales and a plurality of verniers in order to form a plurality of intersections on a plane. The main scales are formed with a first main scale(50a) and a second main scale(50b). The verniers are formed with a first vernier(60a) and a second vernier(60b). The first and the second main scales are separated from each other. The first and the second main scales are formed with rectangular patterns extending to predetermined directions, respectively.
申请公布号 KR20050004601(A) 申请公布日期 2005.01.12
申请号 KR20030044847 申请日期 2003.07.03
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 YOO, DO YUL
分类号 H01L21/027;G01B11/00;G03F7/20;G03F9/00;(IPC1-7):H01L21/027 主分类号 H01L21/027
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