发明名称 POSITION MEASUREMENT METHOD, EXPOSURE METHOD, EXPOSURE DEVICE, AND DEVICE MANUFACTURING METHOD
摘要 <p>With this position measurement method, a mark which has been formed upon an object is illuminated with an illumination beam, a beam which is generated from this mark is picked up via an observation system, and the resultant image signal is signal processed so as to measure positional information which is related to the mark. This signal processing is performed based upon information related to the noise which is included in the component dependent upon the amount of light which is included in the image signal, and upon said image signal. As a result, it is possible to measure the positional information for the mark with good accuracy, even if noise is included in the image signal.</p>
申请公布号 KR20050004258(A) 申请公布日期 2005.01.12
申请号 KR20047019342 申请日期 2003.06.02
申请人 发明人
分类号 G01B11/00;G03F9/00;H01L21/027 主分类号 G01B11/00
代理机构 代理人
主权项
地址