发明名称 |
Etching solution for forming an embedded resistor |
摘要 |
A resistive etching solution containing thiourea, which is particularly suitable for etching an electrically resistive material comprised of a nickel-chromium alloy. The resistive etching solution allows for fast and effective etching of a nickel-chromium alloy in cases where the ratio of (a) copper surface area to (b) nickel/chromium surface area, is relatively large, and where fine feature etching is desired.
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申请公布号 |
US6841084(B2) |
申请公布日期 |
2005.01.11 |
申请号 |
US20020073503 |
申请日期 |
2002.02.11 |
申请人 |
NIKKO MATERIALS USA, INC. |
发明人 |
LILLIE DAN;WANG JIANGTAO |
分类号 |
H05K1/16;C23F1/02;C23F1/28;C23G1/02;C23G1/06;H01C17/24;H01L21/02;H01L21/3213;H05K3/06;(IPC1-7):B44C1/22;C03C15/00;C03C25/68;C23F1/00;C23F3/00 |
主分类号 |
H05K1/16 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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