发明名称 |
Substrate processing apparatus equipping with high-pressure processing unit |
摘要 |
With respect to any one of processing units, a main transportation path, a developing unit, a dedicated transportation robot and a high-pressure processing unit are disposed linearly in this order in a direction. Hence, even if a processing fluid adhering to a substrate or an evaporant of the processing fluid moves toward the main transportation path while the high-pressure processing unit transports the substrate wet with the processing fluid, there are the processing units located which the processing fluid or its evaporant must arrive at before reaching the main transportation path.
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申请公布号 |
US6841031(B2) |
申请公布日期 |
2005.01.11 |
申请号 |
US20020201383 |
申请日期 |
2002.07.23 |
申请人 |
DAINIPPON SCREEN MFG. CO., LTD. |
发明人 |
IWATA TOMOMI;MURAOKA YUSUKE;SAITO KIMITSUGU;MIZOBATA IKUO;MIYAKE TAKASHI;KITAKADO RYUJI |
分类号 |
G03F7/30;B65G49/07;C03C15/00;C03C23/00;G03F7/40;H01L21/00;H01L21/027;H01L21/304;(IPC1-7):H01L21/306 |
主分类号 |
G03F7/30 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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