发明名称 Lithografie-inrichting.
摘要 A lithography device including a first revolver, a second revolver and a driving device. The first revolver includes a transmittance control filter. The second revolver includes transmittance profile filter. The driving device is capable of rotating the second revolver. The first revolver is for positioning the at least one transmittance control filter in the light path. The second revolver is for positioning the at least one transmittance profile filters in the light path.
申请公布号 NL1026600(A1) 申请公布日期 2005.01.11
申请号 NL20041026600 申请日期 2004.07.07
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 YOO-KEUN WON;YOUNG-HEE KIM;YOUNG-HO PARK
分类号 H01L21/027;G03F7/20;(IPC1-7):G03F7/20 主分类号 H01L21/027
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