发明名称 Heterostructure semiconductor device
摘要 A heterostructure semiconductor device that includes a composite layer between an active layer and a gate. The composite layer includes a strain matching layer and a barrier layer. The strain matching layer reduces the strain between the barrier layer and the active layer. The device can incorporate various additional layers as well as gate and/or contact configurations to obtain desired device performance characteristics.
申请公布号 US6841809(B2) 申请公布日期 2005.01.11
申请号 US20030659183 申请日期 2003.09.10
申请人 SENSOR ELECTRONIC TECHNOLOGY, INC. 发明人 FAREED QHALID;GASKA REMIGIJUS;SHUR MICHAEL
分类号 H01L21/335;H01L29/20;H01L31/0328;(IPC1-7):H01L31/032 主分类号 H01L21/335
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