发明名称 LASER IRRADIATION APPARATUS AND APPLICATION METHOD THEREOF FOR REDUCING DAMAGE OF MASK DUE TO LASER BEAMS BY REFLECTING SEQUENTIALLY LASER BEAMS TO DIFFERENT PATHS TO DIFFUSE LASER BEAMS ON MASK
摘要 PURPOSE: A laser irradiation apparatus and an application method thereof are provided to reduce damage of a mask due to laser beams by reflecting sequentially the laser beams to different paths to diffuse the laser beams on a mask. CONSTITUTION: A leaser beam generator(236) is used for generating laser beams. An optic system(240) is used for condensing the laser beams generated from the laser beam generator. A laser beam diffusion unit(250) diffuses laser beam pulses by reflecting sequentially the laser beams to different paths. A mask(238) includes a plurality of same patterns passing the laser beams. A moving stage(246) is used for moving a substrate on which the laser beams are irradiated.
申请公布号 KR20050003235(A) 申请公布日期 2005.01.10
申请号 KR20030043386 申请日期 2003.06.30
申请人 LG.PHILIPS LCD CO., LTD. 发明人 YOU, JAE SUNG
分类号 H01L21/027;(IPC1-7):H01L21/027 主分类号 H01L21/027
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