| 摘要 |
FIELD: cathode-luminescent analysis of materials, plasmochemistry, quantum electronics, and the like. ^ SUBSTANCE: proposed method designed for shaping high-energy (hundreds of keV) subnanosecond (t <= 1 ns) charged particle beams whose current density amounts to tens of amperes per cm2 in gas-filled gap at atmospheric and higher pressure involves following procedures. Volumetric pulsed discharge is effected in gas-filled electrode gap and electron beam is shaped during breakdown of discharge gap as soon as parameter U/(p x d) is brought to value sufficient for shaping runaway electron beam between front of plasma propagating from cathode and anode and volumetric discharge plasma moving to anode is shaped by pre-ionization of gap with fast electrons formed across voltage pulse wavefront due to intensifying field on anode and/or on cathode plasma spots, where U is voltage, V; p is gas pressure, torr; d is gas-filled gap, mm. ^ EFFECT: enhanced energy and current density of generated subnanosecond electron beams. ^ 1 cl |
