PHOTO APPARATUS HAVING WAFER ROTATION UNIT AND METHOD OF PATTERNING OUTER CIRCUMFERENCE REGION OF WAFER USING THE SAME FOR ENHANCING PRODUCTIVITY BY MONITORING AND IMPROVING LOAD EFFECT GENERATED FROM OUTER CIRCUMFERENCE REGION OF WAFER

摘要

PURPOSE: A photo apparatus having a wafer rotation unit and a method of patterning an outer circumference region of a wafer using the same are provided to enhance productivity by monitoring and improving a load effect generated from an outer circumference region of a wafer. CONSTITUTION: A light source(180) is used for generating light for aligning a wafer(160) and a reticle. A reticle aligner(170) includes a rotation unit to rotate the wafer at a predetermined speed. A control system is used for controlling a rotating speed and a mode of the rotation unit. A wafer aligner is used for aligning the wafer. The control system includes a memory device, an operating device, and an operation command execution device.