| 摘要 |
PURPOSE: A method for fabricating an array substrate for an LCD with a driving circuit is provided to improve production yield and reduce the fabricating cost by reducing the number of process masks from eight to five. CONSTITUTION: In a method for fabricating an array substrate for an LCD with a driving circuit, a transparent conductive material layer constituting a pixel electrode is formed on the lowest layer of a substrate(100). A gate line including a gate electrode is formed using a doped polysilicon. The pixel electrode is formed by partially etching the transparent conductive layer using a photoresist pattern that is used as a blocking mask during n+ and p+ doping. The method includes five mask process steps. In the first mask process, a photoresist is deposited on a second amorphous silicon layer. In the second mask process, a photoresist is deposited on the gate electrode of the polysilicon and the substrate on which the gate line and a semiconductor layer are formed. In the third mask process, a photoresist is deposited on the entire surface of the substrate on which a p type ohmic contac layer is formed. In the fourth mask process, a photoresist is deposited on the substrate on which a passivation layer is formed. In the fifth mask process, a metal material is deposited on the passivation layer on which a contact hole of the semiconductor layer and a contact hole of the pixel electrode are formed, and a photoresist is deposited on the substrate on which the p type ohmic contact layer.
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