发明名称 |
CAPACITOR WITH ALUMINUM NITRIDE LAYER AS OXIDATION BARRIER LAYER TO PREVENT OXIDATION OF LOWER ELECTRODE AND MANUFACTURING METHOD THEREOF |
摘要 |
PURPOSE: A capacitor and a method for manufacturing the same are provided to enhance capacitance and to restrain oxidation of a lower electrode by forming an aluminum nitride layer as an oxidation barrier layer between the lower electrode and a dielectric film. CONSTITUTION: A lower electrode(35) is formed on a semiconductor substrate(31). An oxidation barrier layer(36) is formed on the lower electrode, wherein the oxidation barrier layer is composed of an aluminum nitride layer. An alumina(37) as a dielectric film is formed on the oxidation barrier layer. Annealing is then performed. Then, an upper electrode(38) is formed on the annealed alumina.
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申请公布号 |
KR20050003059(A) |
申请公布日期 |
2005.01.10 |
申请号 |
KR20030043186 |
申请日期 |
2003.06.30 |
申请人 |
HYNIX SEMICONDUCTOR INC. |
发明人 |
LEE, JONG MIN;OH, HOON JUNG |
分类号 |
H01L27/108;(IPC1-7):H01L27/108 |
主分类号 |
H01L27/108 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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