GENERATION METHOD OF ASSIST FEATURE USING IMAGE FIELD MAP, COMPUTER PROGRAM PRODUCT, AND PATTERN IMAGING DEVICE

摘要

PURPOSE: Provided are a method for generating an assist feature to a pattern to be formed on the surface of a substrate without using a complex 2D rule-based approach method, a computer program product for generating the assist feature, and a device for imaging a pattern on the surface of a substrate by using a mask. CONSTITUTION: The method comprises the steps of (S100) generating an image field map corresponding to a pattern; (S102) extracting the characteristics of contour from the preset critical value of the image field map; and (S104) generating at least one assist feature to the pattern according to the characteristics. The method comprises further the steps of analyzing the different contour at the preset critical value; determining the dominant axis of the contour the different contour; and arranging the assist feature along the dominant axis of the contour and arranging the other assist feature along the dominant axis of the different contour.