| 摘要 |
PURPOSE: A polishing cloth for a CMP(Chemical Mechanical Polishing) process is provided to prolong the lifetime by forming a plurality of pores capable of becoming grooves in the polishing cloth itself. CONSTITUTION: A polishing cloth includes a plurality of first grooves(11) containing slurry on the surface and a plurality of first to third pores(12a,12b,12c) under the surface. The polishing cloth is abraded as time goes by, so that the first to third pores changes to grooves. The first to third pores are alternately arranged with each other. The upper portion of each second pore is higher than the lower portion of each first pore.
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