METHOD FOR CLEANING METAL LAYER TO PREVENT BRIDGE FROM BEING GENERATED BY GROWTH OF REACTION SOURCE IN SUBSEQUENT PROCESS FOR DEPOSITING INSULATION LAYER

摘要

PURPOSE: A method for cleaning a metal layer is provided to prevent a bridge from being generated by a growth of a reaction source in a subsequent process for depositing an insulation layer by performing a surface treatment on a metal layer while using ozone water and by eliminating ultra pure water and the reaction source. CONSTITUTION: A cleaning process is performed on a metal layer having undergone an etch process by using isopropylene alcohol. A rinse process is performed on the metal layer by using hot ozone water. The hot ozone water rinse process is either a QDR(quick dump rinse) or an overflow.