发明名称 MOVING STAGE FOR LITHOGRAPHY PROJECTION EQUIPMENT SYSTEM, LITHOGRAPHY PROJECTION EQUIPMENT, AND METHOD FOR MANUFACTURING DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a moving stage whose movement can be accurately controlled. SOLUTION: A moving stage system 10 for lithography projection equipment 1 is equipped with at least a base 12, a platform 11 movable relative to the base, a balance mass 13, 14 which are movable relative to the base and compensate a force produced from the platform, and a driving mechanism 15 to 19 which is constituted to move the platform and balance mass relative to the base. The driving mechanism is equipped with; at least one of belt transmission apparatuses 15 to 17, 151 to 152 which connect the platform and balance mass to move the balance mass at least partially in the opposite moving direction 21, 22 when the platform moves in the moving direction 20; and the driving apparatus 19 which mechanically engages with at least one of the balance mass or platform to directly drive the platform and balance mass. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005005714(A) 申请公布日期 2005.01.06
申请号 JP20040172056 申请日期 2004.06.10
申请人 ASML NETHERLANDS BV 发明人 LOOPSTRA ERIK ROELOF;MUNNIG SCHMIDT ROBERT-HAN
分类号 G03F7/20;H01L21/027;H01L21/68;(IPC1-7):H01L21/027 主分类号 G03F7/20
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