发明名称 SUBSTRATE CONTAINER
摘要 PROBLEM TO BE SOLVED: To provide a substrate container in which a substrate is prevented from rubbing against a retainer to become dirty or the position of the substrate is varied and in which the retainer is protected against creep deformation even after a continuous use and the position of the substrate is prevented from varying to cause a trouble in delivering/receiving work. SOLUTION: The substrate container comprises a front open box type container body 1 for containing semiconductor wafers W while arranging a pair of supporting units for supporting the semiconductor wafers W contained in the container body 1 while being arranged at the circumferential edge on the opposite sides, and a rear retainer 20 attached to the inner back of the container body 1 and supporting the circumferential edge at the rear end of the semiconductor wafers W. The rear retainer 20 has a base plate 21 with a plurality of grooves 27 formed vertically in the direction intersecting the containing direction of the semiconductor wafer W perpendicularly. Each groove 27 has a reverse V-shaped cross-section wherein the vicinity of the inclining face 26 is formed thick and the vicinity of a valley 25 for regulating the position of the semiconductor wafer W is formed thin to allow elastic deformation. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005005525(A) 申请公布日期 2005.01.06
申请号 JP20030168088 申请日期 2003.06.12
申请人 SHIN ETSU POLYMER CO LTD 发明人 SHINTANI WATARU;MIMURA HIROSHI
分类号 B65D85/86;H01L21/673;H01L21/68;(IPC1-7):H01L21/68 主分类号 B65D85/86
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