| 摘要 |
PROBLEM TO BE SOLVED: To provide a manufacturing method of an electrooptical device by which reduction of an element effective surface area can be realized while uniformity of element characteristics of an intra-surface is held, in the electrooptical device provided with a two terminal type nonlinear element such as a TFD (Thin Film Diode) element and to provide a manufacturing method of the two terminal type nonlinear element. SOLUTION: The manufacturing method of the electrooptical device has a stage for pattern-forming a lower electrode 14 on a supporting substrate (an element substrate) 10, a stage for anodically oxidizing the lower electrode 14 in the state in which an upper surface 14a of the lower electrode 14 is partially masked by a mask material 40 to form a first region 181 of an insulating layer 18, a stage for removing the mask material 40 and a stage for forming a second region 182 having a layer thickness thinner than that of the first region 181 of the insulating layer 18 at a surface region 14c of the lower electrode 14 exposed by removing the mask material 40. COPYRIGHT: (C)2005,JPO&NCIPI |
