发明名称 ROTARY APPLICATOR AND ROTARY APPLYING METHOD
摘要 PROBLEM TO BE SOLVED: To provide a rotary applicator and a rotary applying method by which a coating liquid can be evenly applied on a substrate to be treated, which have simple constitution and by which treatment time by a spin coat method can be shortened. SOLUTION: The rotary applicator in which the substrate to be treated 11 is rotated at high speed and the coating liquid is spread on the substrate to be treated 11 and then is dried is provided with a gas blowing-out apparatus 51 which blows gas onto a surface of the substrate to be treated 11 to dry the coating liquid. In the gas blowing-out apparatus 51, air flow of the gas blown on the surface of the substrate to be treated 11 is made to decrease as it goes away from a rotation center of the substrate to be treated 11. Gas blowing-out ports 53 of the gas blowing-out apparatus 51 are provided only within a range corresponding to an inscribed circle C of the substrate to be treated 11 centering on a rotation center S of the substrate to be treated 11. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005000726(A) 申请公布日期 2005.01.06
申请号 JP20030163810 申请日期 2003.06.09
申请人 SHARP CORP 发明人 NAKANISHI HIROKAZU;ISHIDA JUNICHI;TADERA TAKAMITSU;WATANABE KEIICHIRO;YONETANI MASATO
分类号 B05D1/40;B05C9/12;B05C11/08;H01L21/027;H01L21/31;(IPC1-7):B05C9/12 主分类号 B05D1/40
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