发明名称 |
Lithographic apparatus and method of a manufacturing device |
摘要 |
A lithographic projection apparatus having a radiation system for providing a projection beam of radiation; a support structure for supporting a patterning device, the patterning device serving to pattern the projection beam according to a desired pattern; a substrate holder for holding a substrate the substrate holder provided with a device to provide a holding force for pressing the substrate against the substrate holder; a releasing structure constructed and arranged to eject the substrate from the holder against the holding force; and a projection system for projecting the patterned beam onto a target portion of the substrate. The lithographic projection apparatus may include a controller for controlling the releasing structure so as to release the substrate from the holder with a release force that is reduced prior to final release.
|
申请公布号 |
US2005002010(A1) |
申请公布日期 |
2005.01.06 |
申请号 |
US20040840797 |
申请日期 |
2004.05.07 |
申请人 |
ASML NETHERLANDS B.V. |
发明人 |
ZAAL KOEN JACOBUS JOHANNES MARIA;VAN EMPEL TJARKO ADRIAAN RUDOLF;VAN MEER ASCHWIN LODEWIJK HENDRICUS JOHANNES;MIEDEMA JAN REIN;OTTENS JOOST JEROEN |
分类号 |
H01L21/683;G03F7/20;H01L21/027;(IPC1-7):G03B27/58 |
主分类号 |
H01L21/683 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|