| 摘要 |
An exposure apparatus for exposing a pattern on an original onto the substrate includes an illumination system for illuminating a mark on a substrate, a detector for detecting a position of the mark by detecting light from the mark via an optical system; a measurement unit for measuring a relationship between a focus state of the optical system on the mark and a position detection result of the mark, and a storage for storing substantially the same information as the relationship regarding the mark on the substrate to be exposed.
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