| 发明名称 |
Volatile copper(II) complexes for deposition of copper films by atomic layer deposition |
| 摘要 |
The present invention relates to novel 1,3-diimine copper complexes and the use of 1,3-diimine copper complexes for the deposition of copper on substrates or in or on porous solids in an Atomic Layer Deposition process. This invention also provides a process for making amino-imines and novel amino-imines.
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| 申请公布号 |
US2005003075(A1) |
申请公布日期 |
2005.01.06 |
| 申请号 |
US20040499934 |
申请日期 |
2004.06.18 |
| 申请人 |
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发明人 |
BRADLEY ALEXANDER ZAK;THORN DAVID LINCOLN;THOMPSON JEFFREY SCOTT |
| 分类号 |
C07C249/02;C07C251/12;C07C251/16;C07D213/74;C07F1/08;C23C16/18;H01L21/285;(IPC1-7):C07F1/08;B32B15/04 |
主分类号 |
C07C249/02 |
| 代理机构 |
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代理人 |
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| 主权项 |
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