| 发明名称 |
POSITIVE PHOTORESIST COMPOSITION FOR DISCHARGE NOZZLE SYSTEM COATING METHOD AND METHOD FOR FORMING RESIST PATTERN |
| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a positive photoresist composition to be suitably used for a discharge nozzle system resist coating method. <P>SOLUTION: The positive photoresist composition is used for a discharge nozzle system coating method including a process of applying the positive photoresist composition on the entire surface of a substrate by relatively moving the discharge nozzle and the substrate. The composition comprises: (A) an alkali-soluble novolac resin; (C) a naphthoquinone diazide group-containing compound; (D) an organic solvent; and (E) a surfactant. The content of the surfactant (E) is ≤900 ppm. <P>COPYRIGHT: (C)2005,JPO&NCIPI |
| 申请公布号 |
JP2005004172(A) |
申请公布日期 |
2005.01.06 |
| 申请号 |
JP20040082458 |
申请日期 |
2004.03.22 |
| 申请人 |
TOKYO OHKA KOGYO CO LTD |
发明人 |
MORIO KIMITAKA;AOKI TOMOSABURO;KATO TETSUYA;NAKAJIMA TETSUYA |
| 分类号 |
G03F7/004;B05D1/26;B05D1/40;G03F7/023;G03F7/16;H01L21/027 |
主分类号 |
G03F7/004 |
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