THIN FILM DEPOSITION SYSTEM AND THIN FILM DEPOSITING METHOD

摘要

PROBLEM TO BE SOLVED: To provide a thin film deposition system and thin film depositing method capable of homogeneously depositing thin films on a substrate of a large area.

SOLUTION: The thin film deposition system 1 is so constituted that a mask 5 having apertures 5a and 5b opened with the regions on the substrate 3 corresponding to erosion regions 7a and 7b moves together with a magnet 4 for generating the erosion regions 7a between a target 2 and the substrate 3 when the magnet 4 moves to the plane direction of the target 2. The particles released from the target 2 arrive at the regions 3 corresponding to the erosion regions 7a and 7b through the apertures 5a and 5b but the arrival thereof at the regions on the substrate 3 exclusive thereof is obstructed by the mask 5. The magnet 4 and the mask 5 move together and only the particles past the apertures 5a and 5b are deposited on the substrate 3 and the homogeneous thin films can be formed over a wide area without the formation of the heterogeneous thin films.

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