| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a photomask with which lithography with high accuracy can be performed while suppressing increase in cost, and to provide a method for manufacturing the photomask. <P>SOLUTION: The photomask consists of a transparent substrate 1 as a first transparent substrate and transparent substrates 2, 3, 4 as a plurality of second transparent substrates opposing to the transparent substrate 1 and detachably attached to the transparent substrate 1, the second substrates having respective light shielding patterns 5, 6, 7 different from one another. A specified light shielding pattern is produced by combining the light shielding patterns 5, 6, 7 formed in the transparent substrates 2, 3, 4. <P>COPYRIGHT: (C)2005,JPO&NCIPI</p> |
