发明名称 Inspection method and apparatus of laser crystallized silicons
摘要 An inspection method and apparatus of laser crystallized silicons in the low-temperature poly Si (LTPS) process. The crystalline quality is inspected by using a visible light source to irradiate the surface of the poly Si and examining the variations of the reflected light caused by the protrusion arrangement at the surface of the poly Si. This method can be adopted on the poly Si samples prepared by the line scanning of the excimer laser annealing (ELA) technology.
申请公布号 US2005002016(A1) 申请公布日期 2005.01.06
申请号 US20040792833 申请日期 2004.03.05
申请人 AU OPTRONICS CORP. 发明人 TSAO I-CHANG
分类号 G01N21/95;H01L21/20;H01L21/268;(IPC1-7):H01L21/26 主分类号 G01N21/95
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