| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide method of manufacturing a photomask for evaluating an aligner which assures higher evaluation accuracy and less rounding error, and also to provide the same photomask and a method of evaluating aberration using the same photomask. <P>SOLUTION: The method of manufacturing the photomask for evaluating an exposure apparatus comprises processes for designing an original pattern 14 including a pattern 1 for evaluation, forming a pattern in which the designed original pattern 14 is located on a grid 90, and forming a photomask 5 including a mask pattern by transferring the pattern located on the grid 90 on a transparent substrate 11. The original pattern 14 in which an angle formed by the side 10c and the side 10a is limited to non-continuous values is located on the grid 90 by setting the length of the side 10a in the right triangle of the pattern 1 for evaluation to the length of each of j (j=12) grids, and by setting the length of the side 10b to the length of each of k (k=3) grids. <P>COPYRIGHT: (C)2005,JPO&NCIPI</p> |
