| 摘要 |
PROBLEM TO BE SOLVED: To provide an aligner which can suppress deterioration of a pattern image projected on a substrate for the exposure conducted by filling the space between a projecting optical system and a substrate with the water. SOLUTION: The water 50 supplied to at least a part of the area between the projecting optical system, and the substrate is adjusted to 4°C or proximity thereof in which change is small in the refractive index for temperature change. COPYRIGHT: (C)2005,JPO&NCIPI
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