| 摘要 |
PROBLEM TO BE SOLVED: To provide a glass dry plate with which a working mask adaptable to jumbo size can be fabricated without varying the size of the glass substrate, with which adhesion in fabrication of a photoresist is finished in a short time, and which is adaptable to a printer with aligning pins. SOLUTION: In the silver halide photographic glass dry plate including at least one silver halide emulsion layer formed by applying a silver halide emulsion to a glass substrate, the glass substrate has at least two holes and the silver halide emulsion is applied in such a way that at least one side of the applied surface reaches a position where at least part of the side comes in contact with one of the holes or a position on the outside of one of the holes. COPYRIGHT: (C)2005,JPO&NCIPI
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