| 摘要 |
PROBLEM TO BE SOLVED: To provide a method for producing optical quartz glass which is excellent in laser resistance and suitable to be used for an optical device utilizing high-output laser light, e.g. an excimer laser, in the ultraviolet range; and optical quartz glass made thereby and excellent in laser resistance. SOLUTION: Quartz glass 10 excellent in laser resistance is produced by a method comprising the following: a porous glass body formation step 1 wherein a porous glass body is formed by subjecting silicon tetrachloride as a raw material to flame hydrolysis in a surplus oxygen state by a VAD method using an oxyhydrogen burner, a primary heat treatment step 2 wherein a high-temperature treatment is performed in an atmosphere containing hydrogen in a content lower than 4 vol.%, i.e. the explosion limit, and a sintering treatment step 3. COPYRIGHT: (C)2005,JPO&NCIPI
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