发明名称 Over-clocking in a microdeposition control system to improve resolution
摘要 A microdeposition system (20) and method deposits precise amounts of fluid material onto a substrate. A microdeposition head (50) includes a plurality of spaced nozzles that fire droplets having a deposited width when deposited on the substrate. A positioning device moves the microdeposition head (50) relative to the substrate at a head speed. A controller (22) generates over-clocking signals at a rate that is substantially greater than the head speed divided by the droplet width to improve resolution. The controller (22) includes a positioning module that generates position control signals for the positioning device. The controller (22) includes a nozzle firing module (114) that generates nozzle firing commands based on the over-clocking rate to fire the nozzles to form droplets that define features on the substrate.
申请公布号 US2005000422(A1) 申请公布日期 2005.01.06
申请号 US20040479316 申请日期 2004.06.14
申请人 EDWARDS CHARLES O.;ALBERTALLI DAVID;BIELICH HOWARD WALTER;MIDDLETON JAMES 发明人 EDWARDS CHARLES O.;ALBERTALLI DAVID;BIELICH HOWARD WALTER;MIDDLETON JAMES
分类号 B29C67/00;B41J2/045;H01L21/00;H05K3/12;(IPC1-7):B05C11/00 主分类号 B29C67/00
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