发明名称 Semiconductor device and manufacturing method thereof
摘要 A capacitor uses niobium pentoxide in the manufacture of a semiconductor device. The niobium pentoxide has a low crystallization temperature of 600° C. that provides control over the oxidation of the bottom electrode during heat-treatment. A dielectric constituent present as an amorphous oxide along the grain boundaries of polycrystalline niobium pentoxide is used for a capacitor insulator., thereby providing a method to decrease the leakage current along the grain boundary of niobium pentoxide and to realize a high dielectric constant and low-temperature crystallization.
申请公布号 US2005001212(A1) 申请公布日期 2005.01.06
申请号 US20040829300 申请日期 2004.04.22
申请人 HITACHI, LTD. 发明人 MATSUI YUICHI
分类号 H01L21/316;H01L21/02;H01L21/314;H01L21/8242;H01L27/108;H01L29/78;H01L31/0376;(IPC1-7):H01L31/037 主分类号 H01L21/316
代理机构 代理人
主权项
地址