发明名称 |
Contamination control system and air-conditioning system of a substrate processing apparatus using the same |
摘要 |
An air-conditioning system of a substrate processing apparatus includes an air inlet line for providing air to a clean room. A contamination control apparatus for removing contaminants in the air is connected to the air inlet line. A controller controls temperature and humidity of the air without the contaminants. An air outlet line provides the air having the controlled temperature and humidity to a substrate processing chamber that is disposed in the clean room. The contamination control apparatus includes a spray unit having at least one nozzle that sprays water. At least one eliminator that traps the water for capturing contaminants in the air and drops the trapped water into a tank. A water circulation unit provides the water that includes an additive for controlling pH of the water to the spray unit.
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申请公布号 |
US2005000243(A1) |
申请公布日期 |
2005.01.06 |
申请号 |
US20040883584 |
申请日期 |
2004.07.01 |
申请人 |
HWANG TAE-JIN;YANG JAE-HYUN;HWANG JUNG-SUNG;KIM HYUN-JOON;AHN YO-HAN |
发明人 |
HWANG TAE-JIN;YANG JAE-HYUN;HWANG JUNG-SUNG;KIM HYUN-JOON;AHN YO-HAN |
分类号 |
H01L21/02;B01D53/14;B01D53/78;F24F3/16;(IPC1-7):C10K1/08;F22D1/28;B01D47/00;F02M23/14;F02M31/00;F25D17/04 |
主分类号 |
H01L21/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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