发明名称 Method of making diamond product and diamond product
摘要 The method of making a diamond product in accordance with the present invention comprises the steps of forming a diamond substrate (50) with a mask layer (52), and etching the diamond substrate (50) formed with the mask layer (52) with a plasma of a mixed gas composed of a gas containing an oxygen atom and a gas containing a fluorine atom, whereas the fluorine atom concentration is within the range of 0.04% to 6% with respect to the total number of atoms in the mixed gas.
申请公布号 US2005000938(A1) 申请公布日期 2005.01.06
申请号 US20040774417 申请日期 2004.02.10
申请人 SUMITOMO ELECTRIC INDUSTRIES, LTD.;JAPAN FINE CERAMICS CENTER 发明人 NISHIBAYASHI YOSHIKI;MEGURO KIICHI;IMAI TAKAHIRO;ANDO YUTAKA
分类号 C01B31/06;C30B29/04;C30B33/00;H01J1/304;H01J9/02;(IPC1-7):C23F1/00 主分类号 C01B31/06
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