发明名称 |
Method of making diamond product and diamond product |
摘要 |
The method of making a diamond product in accordance with the present invention comprises the steps of forming a diamond substrate (50) with a mask layer (52), and etching the diamond substrate (50) formed with the mask layer (52) with a plasma of a mixed gas composed of a gas containing an oxygen atom and a gas containing a fluorine atom, whereas the fluorine atom concentration is within the range of 0.04% to 6% with respect to the total number of atoms in the mixed gas.
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申请公布号 |
US2005000938(A1) |
申请公布日期 |
2005.01.06 |
申请号 |
US20040774417 |
申请日期 |
2004.02.10 |
申请人 |
SUMITOMO ELECTRIC INDUSTRIES, LTD.;JAPAN FINE CERAMICS CENTER |
发明人 |
NISHIBAYASHI YOSHIKI;MEGURO KIICHI;IMAI TAKAHIRO;ANDO YUTAKA |
分类号 |
C01B31/06;C30B29/04;C30B33/00;H01J1/304;H01J9/02;(IPC1-7):C23F1/00 |
主分类号 |
C01B31/06 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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