LITHOGRAPHIC APPARATUS AND METHOD FOR FABRICATING DEVICE TO ELIMINATE NECESSITY OF GAS SUPPLY

摘要

PURPOSE: A lithographic apparatus is provided to eliminate the necessity of a gas supply and prevent bubbles from being formed in liquid by supplying an effective sealing part for containing liquid to a space between the surface of an imaged substrate and the final element of a projection system. CONSTITUTION: A radiation system supplies a projection beam of radiation. A support structure supports a patterning unit functioning to pattern the projection beam according to a desired pattern. A substrate(W) is held by a substrate table. A liquid supply system supplies liquid to a space(2) between the final element of a projection system(PL) and the substrate, including a sealing member(4) and a liquid sealing unit. The sealing member extends along at least a part of the interface of the space between the final element of the projection system and the substrate. The liquid sealing unit forms a sealing part between the sealing member and the surface of the substrate by a flow of liquid.