发明名称 |
RADIATION SENSITIVE REFRACTIVE INDEX CHANGING COMPOSITION, PATTERN FORMING METHOD AND OPTICAL MATERIAL FOR USE IN PHOTOELECTRIC AND DISPLAY FIELDS |
摘要 |
PURPOSE: A refractive index pattern and optical material are provided, which are obtained by changing refractive index of the material. Difference between the changed refractive indexes is sufficiently great and the refractive index pattern is stable regardless of use condition. CONSTITUTION: A refractive index pattern and optical material are obtained by a radiation sensitive refractive index changing composition that includes inorganic oxide particles, a polymerized compound, a radiation sensitive decomposer, and an escapable compound. A method for forming the refractive index pattern includes irradiating some of the radiation sensitive refractive index changing composition. The refractive index pattern means a refractive index distribution material having different areas.
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申请公布号 |
KR20050001423(A) |
申请公布日期 |
2005.01.06 |
申请号 |
KR20040047696 |
申请日期 |
2004.06.24 |
申请人 |
JSR CORPORATION |
发明人 |
HANAMURA, MASAAKI;KUMANO, ATSUCHI;NISHIKAWA, MICHINORI |
分类号 |
G02F1/361;C08F2/44;C08F2/50;C08K3/00;C08L101/00;G02B1/04;G02B5/18;G02B6/00;G02B6/02;G02B6/028;G02B6/12;G02B6/122;G02B6/124;G03F7/00;G03F7/004;G03F7/038;G03F7/075;G03F7/38;(IPC1-7):G02F1/361 |
主分类号 |
G02F1/361 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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