发明名称 Support mechanism, exposure apparatus having the same, and aberration reducing method
摘要 A support mechanism for supporting an optical element includes a first support member for supporting the optical element, a second support member coupled to the first support member via an elastic member, and a forcing member for applying a force to the elastic member to adjust a position and/or an orientation of the optical element.
申请公布号 US2005002011(A1) 申请公布日期 2005.01.06
申请号 US20040850094 申请日期 2004.05.20
申请人 SUDOH YUJI 发明人 SUDOH YUJI
分类号 G02B7/02;G03B27/58;G03F7/20;H01L21/027;(IPC1-7):G03B27/58 主分类号 G02B7/02
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