发明名称 |
Support mechanism, exposure apparatus having the same, and aberration reducing method |
摘要 |
A support mechanism for supporting an optical element includes a first support member for supporting the optical element, a second support member coupled to the first support member via an elastic member, and a forcing member for applying a force to the elastic member to adjust a position and/or an orientation of the optical element.
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申请公布号 |
US2005002011(A1) |
申请公布日期 |
2005.01.06 |
申请号 |
US20040850094 |
申请日期 |
2004.05.20 |
申请人 |
SUDOH YUJI |
发明人 |
SUDOH YUJI |
分类号 |
G02B7/02;G03B27/58;G03F7/20;H01L21/027;(IPC1-7):G03B27/58 |
主分类号 |
G02B7/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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