发明名称 Processing apparatus, method for fabrication of semiconductor device by using the processing apparatus, and semiconductor device fabricated by this method
摘要 The processing apparatus in accordance with the present invention comprises an object holding unit for holding a processing object, a tool holding unit for holding a tool for processing the processing object, and a relative movement mechanism for causing relative movement of the processing object held in the object holding unit and the tool held in the tool holding unit, while maintaining contact therebetween. The object holding unit and/or the tool holding unit are composed of a plurality of support plates of almost flat shape having elastic property which are arranged in a row.
申请公布号 US2005000943(A1) 申请公布日期 2005.01.06
申请号 US20040853172 申请日期 2004.05.26
申请人 NIKON CORPORATION;NIKON TECHNOLOGIES INC. 发明人 SUGAYA ISAO;ITO AKINORI;KOMATSU ISAO
分类号 B24B37/04;B24B37/30;H01L21/304;(IPC1-7):C23F1/00 主分类号 B24B37/04
代理机构 代理人
主权项
地址