发明名称 VACUUM DEPOSITION APPARATUS
摘要 <P>PROBLEM TO BE SOLVED: To provide a vacuum deposition apparatus having a shutter of a long lifetime. <P>SOLUTION: A substrate holder 5 sets substrates 4a, ... in the center of an upper part of a vacuum chamber 1. A crucible 12 comprising rotating bodies 10, ... having recessed parts 9a, ... to store evaporation materials 8a, ... on the same radius close to the circumference is rotatably fitted below the substrate holder 5. A shutter 51 is disposed between the substrate holder 5 and the crucible 12, and a hole 51H to pass evaporated particles from the crucible 12 in the direction of the substrates is formed in the shutter itself. The shutter 51 is rotated so that the passing hole 51H and a masking part other than the passing hole are at the position facing the recessed parts. <P>COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005002388(A) 申请公布日期 2005.01.06
申请号 JP20030165831 申请日期 2003.06.11
申请人 JEOL LTD 发明人 SHIONO KAORU
分类号 G02B1/11;C23C14/24 主分类号 G02B1/11
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