| 摘要 |
The present invention relates to a lithographic projection apparatus and a method for transferring an object via a load lock between a lithography patterning chamber and a second environment. The load lock forms an inner space that is enclosed by a wall that forms the inner space. The load lock includes a first door that faces the lithography patterning chamber and a second door that faces the second environment. The load lock is at least during part of the transfer vented with a gas that is essentially free from at least one of particles, oxygen, hydrocarbon, and H2O.
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