发明名称 |
Method of forming a carbon nano-material layer using a cyclic deposition technique |
摘要 |
A method of forming a carbon nano-material layer may involve a cyclic deposition technique. In the method, a chemisorption layer or a chemical vapor deposition layer may be formed on a substrate. Impurities may be removed from the chemisorption layer or the chemical vapor deposition layer to form a carbon atoms layer on the substrate. More than one carbon atoms layer may be formed by repeating the method.
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申请公布号 |
US2005003089(A1) |
申请公布日期 |
2005.01.06 |
申请号 |
US20040859166 |
申请日期 |
2004.06.03 |
申请人 |
WON SEOK-JUN;KWON DAE-JIN;JEONG YONG-KUK |
发明人 |
WON SEOK-JUN;KWON DAE-JIN;JEONG YONG-KUK |
分类号 |
C23C16/00;C23C16/02;C23C16/26;C23C16/44;C23C16/455;C30B29/02;C30B29/60;(IPC1-7):C23C16/00 |
主分类号 |
C23C16/00 |
代理机构 |
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