IMMERSION PHOTOLITHOGRAPHY SYSTEM AND METHOD USING INVERTED WAFER PROJECTION OPTICAL INTERFACE TO SIMPLY CONFINE LIQUID AND REDUCE OR COMPLETELY REMOVE LEAKAGE OF LIQUID

摘要

PURPOSE: An immersion photolithography system using an inverted wafer projection optical interface is provided to simply confine liquid and reduce or completely remove a leakage of liquid by including an exposure system and a liquid supply system. CONSTITUTION: An exposure system exposes electromagnetic radiation to a substrate, including a projection optical system(100) for focusing the electromagnetic radiation on the substrate. A liquid supply system supplies liquid to a gap between the projection optical system and the substrate. The projection optical system is located right under the substrate. The liquid supply system is adjusted to form a liquid meniscus(108) over the projection optical system.