Photomask and integrated circuit manufactured by automatically correcting design rule violations in a mask layout file

摘要

A photomask and method for eliminating design rule violations from the photomask are disclosed. A photomask includes a substrate and a patterned layer including at least one feature formed on at least a portion of the substrate. The feature is defined in a mask pattern file generated by comparing a feature dimension associated with a polygon in a mask layout file used to create the mask pattern file with a design rule in a technology file. The mask pattern file is further generated by identifying a design rule violation in the mask layout file if the feature dimension violates the design rule and automatically eliminating the design rule violation by repositioning at least one edge of the polygon.