发明名称 ALIGNMENT DEVICE, ALIGNER, ALIGNMENT METHOD AND EXPOSURE METHOD AND POSITIONAL-INFORMATION DETECTING METHOD
摘要 PROBLEM TO BE SOLVED: To provide an alignment device capable of detecting a mark formed on a transmitting substrate even from either surface side of the substrate and an exposure device. SOLUTION: In the alignment device Al aligning the substrate W on which a specified pattern PA is transferred, and the specified pattern PA; the transmitting substrate W is used as the substrate W, and the device AL has a detecting system 10 detecting the mark formed on a second surface reverse to a first surface through the transmitting substrate W from the first surface side of the transmitting substrate W, on which the specified pattern PA is transferred. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005005444(A) 申请公布日期 2005.01.06
申请号 JP20030166472 申请日期 2003.06.11
申请人 NIKON CORP 发明人 KANEKO KENICHIRO
分类号 G03F9/02;H01L21/027;(IPC1-7):H01L21/027 主分类号 G03F9/02
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